At least three people have been seriously injured in an explosion at an Intel semiconductor factory in the southern Israeli city of Kiryat Gat, Israeli media reported, as emergency crews responded to a fire and a possible hazardous chemical leak.
The Jerusalem Post, citing Israel’s Magen David Adom emergency service, reported that three people sustained serious injuries in the blast on Wednesday.
Israeli police suspected the explosion may have been caused by a gas cylinder detonating, the newspaper reported, although the cause had not been confirmed.
Firefighters investigate possible chemical leak
Israel’s Fire and Rescue Authority warned that hazardous chemicals may have leaked following the explosion, according to local media reports. Crews worked to identify the source of the chemicals and contain the resulting fire.
Israeli news outlet Ynet reported that the incident involved nitrogen trifluoride, a gas used in semiconductor manufacturing. Specialised hazardous materials teams were deployed to monitor conditions and assess potential risks.
The Fire and Rescue Authority later said firefighters had brought the source of the blaze under control, Ynet reported.
Earlier, eight firefighting and rescue teams, alongside specialist hazardous materials units from neighbouring stations, were dispatched to the site.
Intel facility manufactures semiconductor chips
Intel’s Kiryat Gat facility manufactures semiconductor chips, according to The Jerusalem Post.
The extent of any damage to the facility and the circumstances surrounding the explosion remained unclear in the initial reports. Authorities had not confirmed the cause of the incident.
